Adsorptive removal of residual amoxicillin antibiotic using cationic surfactant cetyltrimethylamonium bromide modified nanosilica rice husk

Thi Diu Dinh; Minh Nguyen Phan; Thi Ngoc Mai Pham; Tien Duc Pham

doi:10.51316/jca.2021.069

Authors

Thi Diu Dinh Faculty of Chemistry, University of Science, Vietnam National University – Hanoi, 19 Le Thanh Tong, Hoan Kiem, Hanoi 100000, Vietnam Author
Minh Nguyen Phan Faculty of Chemistry, University of Science, Vietnam National University – Hanoi, 19 Le Thanh Tong, Hoan Kiem, Hanoi 100000, Vietnam Author
Thi Ngoc Mai Pham Faculty of Chemistry, University of Science, Vietnam National University – Hanoi, 19 Le Thanh Tong, Hoan Kiem, Hanoi 100000, Vietnam Author
Tien Duc Pham Faculty of Chemistry, University of Science, Vietnam National University – Hanoi, 19 Le Thanh Tong, Hoan Kiem, Hanoi 100000, Vietnam Author

DOI:

https://doi.org/10.51316/jca.2021.069

Keywords:

Adsorption, Removal, CTAB, Amoxicillin, Nanosilica

Abstract

Amoxicillin (AMX) is a highly antibiotic resistance so that many studies focus on the removal of AMX in water environment. The present study investigated adsorptive removal of beta-lactam antibiotic AMX using a cationic surfactant, cetyltrimethylamonium bromide (CTAB) modified nanosilica (CMNS). The CTAB adsorption on nanosilica was independent of ionic strength, indicating that both electrostatic and hydrophobic interaction induced adsorption. Effective conditions for AMX removal using CMNS were systematically studied. The AMX removal using 10 mg/ mL CMNS reached 99 % at pH 9. Adsorption isotherms of AMX on CMNS at two salt concentrations were in good agreement with Langmuir model than Freundlich model. Adsorption isotherms at different ionic strengths and the surface modification by Fourier transform infrared (FT-IR) spectroscopy demonstrate that AMX adsorption on CMNS was mainly controlled by electrostatic interaction.

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